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STN型产品ITO膜层厚度、面电阻、透过率
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面电阻标称值
(W/□) |
面电阻分布范围
(W/□) |
膜层厚度
(Ǻ) |
透过率
(%) |
耐热性
(W/□) |
蚀刻时间
(S) |
100 |
80～100 |
250±50 |
≥88 |
≤300 |
≤25 |
80 |
60～80 |
300±50 |
≥87 |
≤250 |
≤25 |
60 |
40～60 |
400±50 |
≥87 |
≤180 |
≤30 |
50 |
40～50 |
500±50 |
≥85 |
≤150 |
≤40 |
30 |
20～30 |
800±100 |
≥80 |
≤60 |
≤40 |
20 |
15～20 |
1000±200 |
≥80 |
≤40 |
≤50 |
15 |
10～15 |
1300±200 |
≥86 |
≤30 |
≤60 |
10 |
8～10 |
1800±200 |
≥82 |
≤15 |
≤80 |
7 |
6～8 |
2500±200 |
≥78 |
≤12 |
≤120 |
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| 厚度 |
1.1mm |
0.7mm |
0.55mm |
0.4mm |
Cut off |
| 平整度 |
≤0.05μm/20mm |
≤0.10μm/20mm |
≤0.15μm/20mm |
≤0.20μm/20mm |
0.8～8mm |
| |
二氧化硅膜厚 ≥20nm |
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